【査読付き学術論文】
1) S. Murakami, Y. Yanagida, T. Hatsuzawa, Aspheric Lens Design Using Computational Lithography, Precision Engineering, 50 (2017) 372-379.
2) S. Murakami, M. Saito, O. Yoshida, Optimization of resolution by FDTD analysis in aligner lithography, Precision Engineering, Vol. 44, pp. 171-179, 2016.
3) 村上 成郎，山﨑 祥平，金子 千鶴，NA可変レンズによる高段差マイクロレンズアレーの試作，精密工学会誌，Vol.81，No.10，pp. 951，2015.
【国際会議発表】
1) S. Murakami, Microfabrication of 3D structures by projection optical system, OPTICS & PHOTONICS international Congress 2022, OPTM Session 2, Yokohama, 18-22 April, 2022.
2) S. Murakami, M. Shibuya, Sidewall Lithography by Projection Optics, Optics & Photonics Japan 2017, 1aC5, Tokyo, Oct.30-Nov.2, 2017
3) S. Murakami, Y. Yanagida, T. Hatsuzawa, Optimization for 3D device patterning in projection optics, Proceedings of The 16th International Conference on Precision Engineering, p11, Hamamatsu, Nov.14-16, 2016.
4) S. Murakami, Optical exposure system - today and future, Proceedings of SEMI Technology Symposium 94, pp. 397, 1994.
5) S. Slonaker, S. McNamara, K. Konno, R. Miller, S. Murakami, N. Magome, T. Umatate and H. Tateno, Enhanced global alignment for production optical lithography, Proceedings of SPIE, Vol. 922, Optical Laser Microlithography, pp.73 1988.
6) S. Murakami, T. Matsuura, M. Ogawa, M. Uehara, Laser step alignment for a wafer stepper, Proceedings of SPIE, Vol. 538, Optical Microlithography Ⅳ, pp. 9-16, 1985.
【受賞歴】
1) 2016年1月 2015年度精密工学会沼田記念論文賞
2) 1994年12月 The Second Semi-Technology-Symposium Awardee